ELAS
Vacuum System | |
Chamber | Cryo pump or Turbo and water pump combination |
Loadlock | Rough Vac or High Vac with Cryo or Turbo Pump Seal plate has top and bottom positions for batch processing pallets for thin substrates and single position for thick substrates |
Gauges | Backing pressure pirani Loadlock pressure pirani, ion and piezo combination Chamber pressure pirani, ion and piezo combination Chamber process pessure capacitance manometer |
Roughing Pumps | Dry scroll pumps, with controls to turn off when not required |
Targets | |
No. of targets | 2, 3 or 4 Single RF Plasma Etch in the chamber for batch etching |
Target Power | DC, DC pulsed or RF |
Target types | Large Chi or Planer cathodes |
Etching | |
RF Plasma Etch | Either in Loadlock or Chamber or both |
Ion Beam Etch | Fitted into a target position |
Gases | |
Type | Either inert or reactive or mixed, can be admitted in ot chamber or target ring or both |
Pallet Motion | |
Scans | A chain driven carriage carries the pallet under the target between 4-400cm/min |
Control system | |
PLC | Multiple PLC's connected to each other via ethernet control, communications via Modbus, RS485, RS232 etc. to other devices, such as PSU's etc. to give the most flexible reporting and control. |
HMI | A SCADA system is used on a PC to allow the user to gain full control of the system for automatic or manual use Three password protected levels allow an operator to run the system, a supervisor to modify recipes and a technician to run it manually Multiple recipes can be made and saved so that th operator selects the appropriate one Datalogging of all informationfor each run is provided in a .csv format |
Options | |
RGA | An RGA with bias pumping |
Barcode reader | A barcode reader to allow for recipe selection and lot entry to be automatic |
SQL Interface | The system can connect to an SQL database to obtain recipe information etc. and provide information about its current status |