R & D Deposition Tool

First developed by ESC in 1999, this versatile deposition system is aimed at the research & development market. This flexible solution is easily configurable to meet your individual requirements.

The R&D tools offers up to 4 sputter targets, or up to 8” targets with DC magnetron, RF or HiPIMS. There is a load lock to help deliver repeatable results, with the ability to etch or heat the substrate in the load lock. In the process chamber you can add ion assistance to the process, ion beam milling and RF or DC/pulsed bias voltages. Reactive gases can be introduced into the chamber, or around the targets.

Get in touch to discuss your requirement.